000 00490nmm a2200145Ia 4500
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020 _a9783034877411
100 _aChris R. Kleijn, Christoph Werner
245 0 _aModeling of Chemical Vapor Deposition of Tungsten Films
250 _a1993
260 _bBirkhäuser Basel
_c1993
440 _aProgress in Numerical Simulation for Microelectronics
650 _aMathematics and Statistics
856 _uhttps://doi.org/10.1007/978-3-0348-7741-1
999 _c7945
_d7945