Modeling of Chemical Vapor Deposition of Tungsten Films (Record no. 7945)

000 -LEADER
fixed length control field 00490nmm a2200145Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 230125s9999||||xx |||||||||||||||||und||
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9783034877411
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Chris R. Kleijn, Christoph Werner
245 #0 - TITLE STATEMENT
Title Modeling of Chemical Vapor Deposition of Tungsten Films
250 ## - EDITION STATEMENT
Edition statement 1993
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Name of publisher, distributor, etc. Birkhäuser Basel
Date of publication, distribution, etc. 1993
440 ## - SERIES STATEMENT/ADDED ENTRY--TITLE
Title Progress in Numerical Simulation for Microelectronics
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Mathematics and Statistics
856 ## - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier <a href="https://doi.org/10.1007/978-3-0348-7741-1">https://doi.org/10.1007/978-3-0348-7741-1</a>
Holdings
Withdrawn status Lost status Damaged status Not for loan Home library Current library Date acquired Barcode Date last seen Uniform Resource Identifier Price effective from Koha item type
      Accessible Online ICTS ICTS 01/25/2023 EBK4710 01/25/2023 https://doi.org/10.1007/978-3-0348-7741-1 01/25/2023 electronic book