Modeling of Chemical Vapor Deposition of Tungsten Films

By: Chris R. Kleijn, Christoph WernerMaterial type: Computer fileComputer fileSeries: Progress in Numerical Simulation for MicroelectronicsPublication details: Birkhäuser Basel 1993Edition: 1993ISBN: 9783034877411Subject(s): Mathematics and StatisticsOnline resources: Click here to access online
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Item type Current library Call number URL Status Date due Barcode Item holds
electronic book electronic book ICTS
Link to resource Accessible Online EBK4710
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