Library - International Centre for Theoretical Sciences catalog › Results of search for 'ccl=se,phr:"Progress in Numerical Simulation for Microelectronics"'

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	1.	Modeling of Chemical Vapor Deposition of Tungsten Films by Chris R. Kleijn, Christoph Werner. Series: Progress in Numerical Simulation for MicroelectronicsEdition: 1993Material type: Computer file; Format: electronic Publication details: Birkhäuser Basel 1993Online access: Click here to access online Availability: Items available for reference: Accessible Online (1). : Location(s): . Add to cart (remove)
	2.	Transport Simulation in Microelectronics by Alfred Kersch, William J. Morokoff. Series: Progress in Numerical Simulation for MicroelectronicsEdition: 1995Material type: Computer file; Format: electronic Publication details: Birkhäuser Basel 1995Online access: Click here to access online Availability: Items available for reference: Accessible Online (1). : Location(s): . Add to cart (remove)